GEW, the UK-based UV curing systems manufacturer, has announced the launch of its groundbreaking EOS power and control platform, which rolls out at LOUPE Americas in Chicago this week.
Production advantages
EOS replaces GEW’s renowned RHINO Power infrastructure, bringing a broad range of production advantages for users. A total redesign of GEW’s power supplies, control electronics, cabling and all UV system control software brings efficiency and modularity, while in-house manufacturing brings quality control and expertise. Furthermore, its intelligent, serialised lampheads enable vastly improved telemetry and OEM integration options, with serviceability and support for modern communication protocols.
With EOS, new reporting features such as hour and reflector counters come as standard, along with enhanced remote monitoring functionality. The EOS platform remains fully compatible with GEW’s patented, interchangeable ArcLED technology, and introduces end-to-end encryption of all communications traffic.
Robert Rae, Managing Director at GEW, comments: “EOS will completely transform the functionality, capability and integration of our UV curing systems. It brings a more seamless and ergonomic operator experience, and its superb connectivity enables a huge variety of control and I/O options to be integrated, creating more telemetry and data for enhanced analyses.”
DoseGuard precision control system
In addition to EOS, GEW will highlight its DoseGuard precision control system, and its innovative new Air Blast Cooler. Rae concludes: “The diverse range of key product innovations we have to offer at LOUPE Americas makes a stop at our booth an absolute must for every visitor.”
GEW | Booth 3500, LOUPE Americas, Rosemont, Chicago | 15-17 September 2026